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Beumyoung Park
Beumyoung Park
Pusan National University
Polymer
Tungsten
Polishing
Abrasive
Wafer
1
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27
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Self-Conditioning Fixed Abrasive Pad in CMP
2004
Journal of The Electrochemical Society
Hoyoun Kim
Beumyoung Park
Sangick Lee
Haedo Jeong
David Dornfeld
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Citations (27)
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