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Hyung-Sang Park
Hyung-Sang Park
ASM International
Plasma-enhanced chemical vapor deposition
Atomic layer deposition
Photolithography
Photoresist
Electronic engineering
2
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38
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Low temperature plasma-enhanced ALD enables cost-effective spacer defined double patterning (SDDP)
2009
Julien Beynet
Patrick Wong
Andy Miller
Sabrina Locorotondo
Diziana Vangoidsenhoven
Tae Ho Yoon
M. Demand
Hyung-Sang Park
Tom Vandeweyer
Hessel Sprey
Yong-Min Yoo
Mireille Maenhoudt
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Citations (23)
Evaluation of integrity and barrier performance of atomic layer deposited WNxCy films on plasma enhanced chemical vapor deposited SiO2 for Cu metallization
2006
Applied Physics Letters
Ki-Su Kim
Moon-Sang Lee
Sung-Soo Yim
Hyun-Mi Kim
Ki-Bum Kim
Hyung-Sang Park
Wonyong Koh
Wei-Min Li
Maarten Stokhof
Hessel Sprey
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Citations (15)
1