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Tsukasa Kawashima
Tsukasa Kawashima
Dai Nippon Printing
Lithography
Scanning electron microscope
Wafer
Engineering
Optical proximity correction
6
Papers
9
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Fine pixel SEM image for EUV mask pattern 3D quality assurance based on lithography simulation
2006
Eiji Yamanaka
Mitsuyo Kariya
Shinji Yamaguchi
Satoshi Tanaka
Kohji Hashimoto
Masamitsu Itoh
Hideaki Kobayashi
Tsukasa Kawashima
Shogo Narukawa
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Reticle SEM specifications required for lithography simulation
2006
Mitsuyo Kariya
Eiji Yamanaka
Satoshi Tanaka
Takahiro Ikeda
Shinji Yamaguchi
Masamitsu Itoh
Hideaki Kobayashi
Tsukasa Kawashima
Shogo Narukawa
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Mask pattern quality assurance based on lithography simulation with fine pixel SEM image
2005
Mitsuyo Kariya
Eiji Yamanaka
Satoshi Tanaka
Takahiro Ikeda
Shinji Yamaguchi
Kohji Hashimoto
Masamitsu Itoh
Hideaki Kobayashi
Tsukasa Kawashima
Shogo Narukawa
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Citations (3)
Reticle SEM specifications required for lithography simulation
2005
Mitsuyo Kariya
Eiji Yamanaka
Satoshi Tanaka
Takahiro Ikeda
Shinji Yamaguchi
Masamitsu Itoh
Hideaki Kobayashi
Tsukasa Kawashima
Shogo Narukawa
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Citations (2)
A photomask defect evaluation system
2004
Eiji Yamanaka
Shingo Kanamitsu
Takashi Hirano
Satoshi Tanaka
Takahiro Ikeda
Osamu Ikenaga
Tsukasa Kawashima
Syogo Narukawa
Hideaki Kobayashi
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Citations (2)
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