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Shoichiro Yasunami
Shoichiro Yasunami
Polymer
Resist
Materials science
Surface roughness
Nanotechnology
3
Papers
12
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The material design to reduce outgassing in acetal-based chemically amplified resist for EUV lithography
2006
Seiya Masuda
Yasutomo Kawanishi
Shuuji Hirano
Sou Kamimura
Kazuyoshi Mizutani
Shoichiro Yasunami
Yasumasa Kawabe
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Citations (11)
A HFIPS-based polymer approach for 157-nm single layer photoresist
2003
Journal of Photopolymer Science and Technology
Shinichi Kanna
Kazuyoshi Mizutani
Shoichiro Yasunami
Yasumasa Kawabe
Shiro Tan
Morio Yagihara
Tadayoshi Kokubo
Sanjay Malik
Stephanie Dilocker
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A HFIPS-based Polymer Approach for 157 nm Single Layer Photoresist
2003
Journal of Photopolymer Science and Technology
Shinichi Kanna
Kazuyoshi Mizutani
Shoichiro Yasunami
Yasumasa Kawabe
Shiro Tan
Morio Yagihara
Tadayoshi Kokubo
Sanjay Malik
Stephanie Dilocker
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Citations (1)
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