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Hiromasa Fujimoto

Tokyo Institute of Technology

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Epitaxial growth and electrical conductance of metal (CoSi 2 )/insulator(CaF 2 ) nanometer-thick layered structures on Si(111)

1992 Journal of Electronic Materials
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Epitaxial Growth of Metal(CoSi2)/Insulator(CaF2) Nanometer-Thick Layered Structure on Si(111)

1992 Japanese Journal of Applied Physics
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