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V. Shishodia
V. Shishodia
University of Florida
Thin film
Inorganic chemistry
Materials science
Analytical chemistry
Plasma etching
3
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101
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Etch characteristics of HfO2 films on Si substrates
2002
Applied Surface Science
S. Norasetthekul
P.Y. Park
K. H. Baik
K. P. Lee
J.H. Shin
B.S. Jeong
V. Shishodia
David P. Norton
S. J. Pearton
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Citations (47)
Etch characteristics of HfO 2 films on Si substrates
2002
Applied Surface Science
S. Norasetthekul
P.Y. Park
K. H. Baik
Kun Pyo Lee
J.H. Shin
Byeong-Woo Jeong
V. Shishodia
David P. Norton
S. J. Pearton
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Citations (1)
Dry etch chemistries for TiO2 thin films
2001
Applied Surface Science
S. Norasetthekul
P.Y. Park
K. H. Baik
K. P. Lee
J.H. Shin
B.S. Jeong
V. Shishodia
E. S. Lambers
David P. Norton
S. J. Pearton
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Citations (53)
1