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G. Capetti
G. Capetti
Numonyx
Overlay
Laser
Chromatic aberration
Photolithography
Immersion lithography
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Laser bandwidth effect on overlay budget and imaging for the 45 nm and 32nm technology nodes with immersion lithography
2010
Proceedings of SPIE
Umberto Iessi
Michiel Kupers
Elio De Chiara
Pierluigi Rigolli
Ivan Lalovic
G. Capetti
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Citations (12)
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