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Olivia L. Hendricks
Olivia L. Hendricks
Stanford University
Materials science
Atomic layer deposition
Inorganic chemistry
Silicon
Oxide
5
Papers
68
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Atomic Layer Deposited TiO2–IrOx Alloys Enable Corrosion Resistant Water Oxidation on Silicon at High Photovoltage
2019
Chemistry of Materials
Olivia L. Hendricks
Robert Tang-Kong
Aein S. Babadi
Paul C. McIntyre
Christopher E. D. Chidsey
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Citations (12)
Atomic Layer Deposited TiO2–IrOx Alloy as a Hole Transport Material for Perovskite Solar Cells
2018
Advanced Materials Interfaces
Wanliang Tan
Olivia L. Hendricks
Andrew C. Meng
Michael R. Braun
Michael D. McGehee
Christopher E. D. Chidsey
Paul C. McIntyre
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Citations (11)
Atomic Layer Deposited Transition Metal Oxide-Titania Alloys As Corrosion Resistant Schottky Contacts for Silicon Photoanodes
2017
Olivia L. Hendricks
Andrew C. Meng
Andrew G. Scheuermann
Paul K. Hurley
Paul C. McIntyre
Christopher E. D. Chidsey
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Titanium Oxide Crystallization and Interface Defect Passivation for High Performance Insulator-Protected Schottky Junction MIS Photoanodes
2016
ACS Applied Materials & Interfaces
Andrew G. Scheuermann
John P. Lawrence
Andrew C. Meng
Kechao Tang
Olivia L. Hendricks
Christopher E. D. Chidsey
Paul C. McIntyre
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Citations (30)
Isolating the Photovoltaic Junction: Atomic Layer Deposited TiO2–RuO2 Alloy Schottky Contacts for Silicon Photoanodes
2016
ACS Applied Materials & Interfaces
Olivia L. Hendricks
Andrew G. Scheuermann
M Schmidt
Paul K. Hurley
Paul C. McIntyre
Christopher E. D. Chidsey
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Citations (15)
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