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Krishna Gandi Sachdev
Krishna Gandi Sachdev
IBM
Sulfonium
Lithography
Trifluoromethanesulfonate
Photoresist
Photolithography
2
Papers
4
Citations
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New negative tone resists for sub-quarter micron lithography
1995
Microelectronic Engineering
Harbans S. Sachdev
Ranee Wai-Ling Kwong
Wu-Song Huang
Ahmad D. Katnani
Krishna Gandi Sachdev
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Citations (4)
Atmosphärbeständige, hochempfindliche, mit Säure verstärkte Photoresiste
1994
Kim Y. Lee
Krishna Gandi Sachdev
Harbans Singh Sachdev
Ratnam Sooriyakumaran
Premlatha Jagannathan
Mahmoud Khojasteh
Ahmad D. Katnani
Ranee Wai-Ling Kwong
William R. Brunsvold
James Thomas Fahey
George Joseph Hefferon
Wu-Song Huang
Robert Lavin Wood
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