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Dong-Il Park
Dong-Il Park
Photronics, Inc.
Materials science
Resist
Photomask
Optics
Engineering drawing
9
Papers
14
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The feasibility study of thin Cr film for low process bias
2003
Woong-Won Seo
Si-Yeul Yoon
Dong-Il Park
Eui-Sang Park
Jin-Min Kim
Sung-Mo Jeong
Sang-Soo Choi
Han Sun Cha
Kee Soo Nam
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Comparative evaluation of positive and negative chemically amplified resist characteristics for 90-nm-node photomask production
2003
Woo-Gun Jeong
Dong-Il Park
Eui-Sang Park
Soon Kyu Seo
Hyuk-Joo Kwon
Jin-Min Kim
Sung-Mo Jung
Sang-Soo Choi
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Modeling and correction of global CD uniformity caused by fogging and loading effects in 90-nm-node CAR process
2003
Dong-Il Park
Eui-Sang Park
Jong-Hwa Lee
Woo-Gun Jeong
Soon Kyu Seo
Hyuk-Joo Kwon
Jin-Min Kim
Sung-Mo Jung
Sang-Soo Choi
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Dehydration bake effects with UV/O3 treatment for 130-nm node PSM processing
2003
Yong-Dae Kim
Dong-Seuk Lee
Dong-Il Park
Hyuk-Joo Kwon
Jin-Min Kim
Sung-Mo Jung
Sang-Soo Choi
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Comparative Evaluation of Mask Production CAR Development Process with Stepwise Defect Inspection
2002
Woo-Gun Jeong
Jung-Kwan Lee
Dong-Il Park
Eu-Sang Park
Jong-Hwa Lee
Sun-Kyu Seo
Dong-Heok Lee
Jin-Min Kim
Sang-Soo Choi
Soo Hong Jeong
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