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Keiji Ishibashi
Keiji Ishibashi
National Institute for Materials Science
Analytical chemistry
Physics
Polar
Optoelectronics
Crystal growth
2
Papers
7
Citations
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Effects of substrate self-bias and nitrogen flow rate on non-polar AlN film growth by reactive sputtering
2019
Japanese Journal of Applied Physics
Kota Tatejima
Takahiro Nagata
Keiji Ishibashi
Kenichiro Takahashi
Setsu Suzuki
Atsushi Ogura
Toyohiro Chikyow
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Citations (5)
Crystal growth of a MnS buffer layer for non-polar AlN on Si (100) deposited by radio frequency magnetron sputtering
2019
Japanese Journal of Applied Physics
Kota Tatejima
Takahiro Nagata
Keiji Ishibashi
Kenichiro Takahashi
Setsu Suzuki
Atsushi Ogura
Toyohiro Chikyow
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Citations (2)
1