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Sinji Okazaki
Sinji Okazaki
Optics
Extreme ultraviolet lithography
Optoelectronics
Extreme ultraviolet
Analytical chemistry
6
Papers
29
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Thermal distortion model of mask for extreme ultraviolet lithography during periodic scanning exposure
2001
MNC | International Microprocesses and Nanotechnology Conference
A. Chiba
K Ota
T Ogawa
Sinji Okazaki
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Citations (5)
Approach to Patterning of Extreme Ultraviolet Lithography Masks using Ru Buffer Layer : Surfaces, Interfaces, and Films
2001
Byoung Taek Lee
Eiichi Hoshino
Masashi Takahashi
Takashi Yoneda
Hiromasa Yamanashi
Hiromasa Hoko
Man-Hyoung Ryoo
Akira Chiba
Masaaki Ito
Minoru Sugawara
Tarou Ogawa
Sinji Okazaki
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Approach to Patterning of Extreme Ultraviolet Lithography Masks using Ru Buffer Layer
2001
Japanese Journal of Applied Physics
Byoung Taek Lee
Eiichi Hoshino
Masashi Takahashi
Takashi Yoneda
Hiromasa Yamanashi
Hiromasa Hoko
Man-Hyoung Ryoo
Akira Chiba
Masaaki Ito
Minoru Sugawara
Tarou Ogawa
Sinji Okazaki
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Citations (4)
Electron Beam Direct Writing Technology for 64-Mb DRAM LSIs : Lithography Technology
1991
Fumio Murai
Yoshinori Nakayama
Isao Sakama
Toru Kaga
Yoshinobu Nakagome
Yoshifumi Kawamoto
Sinji Okazaki
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