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Anoop Sreenath
Anoop Sreenath
Applied Materials
Mask inspection
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Extreme ultraviolet lithography
Optoelectronics
Extreme ultraviolet
2
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6
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Current status of EUV mask inspection using 193nm optical inspection system in 30nm node and beyond
2011
Sang Hoon Han
Jihoon Na
Won-Il Cho
Dong-Hoon Chung
Chan Uk Jeon
Han-Ku Cho
Dana Bernstein
Eun Young Park
Anoop Sreenath
Shmoolik Mangan
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Evaluation of novel EUV mask inspection technologies
2010
Shmoolik Mangan
Aya Kantor
Nir Shoshani
Asaf Jaffe
Dror Kasimov
Vladislav Kudriashov
Ran Brikman
Lior Shoval
Anoop Sreenath
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Citations (2)
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