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Oda Osamu
Oda Osamu
Materials science
Semiconductor
Plasma
Gallium nitride
Plasma etching
4
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2024
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ラジカル増強MOCVD(REMOCVD)で成長させたホモエピタキシャルGaNの結晶品質に及ぼすチェンバ圧力の影響【JST・京大機械翻訳】
2020
Journal of Crystal Growth
Amalraj Frank Wilson
Shimizu Naohiro
Oda Osamu
Ishikawa Kenji
Hori Masaru
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Effects of Additive Gases on Characteristics of Low Damage Plasma Etching of GaN in Cl2 Based Plasma at High Temperature
2017
The Japan Society of Applied Physics
Masato Imamura
Liu Zecheng
Pan Jialin
Nanide Atsushi
Ishikawa Kenzi
Takeda Keigo
Kondo Hiroki
Oda Osamu
Sekine Makoto
Hori Masaru
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To Realize the Perfect Crystallization. Recent Developments in InP Crystal Growth.
1998
Asahi Toshiaki
Hirano Ryuichi
Kohiro Kenji
Kainosho Keiji
Uchida Masayuki
Oda Osamu
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Present State and Prospect of Staining-proof and Low Contamination Coating Materials.“Ceramic Coating Material ( Mukicoat 1000 ).
1998
Oda Osamu
Kai Tadao
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