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Mutsumi Hara
Mutsumi Hara
Hoya Corporation
Dry etching
Resist
Composite material
Optoelectronics
Etching
6
Papers
7
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Development of new chrome-blanks for 65nm-node and beyond
2004
Masahiro Hashimoto
Takeyuki Yamada
Minoru Sakamoto
Mutsumi Hara
Y. Ohkubo
M. Ushida
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Development of new chrome blanks for 65-nm node and beyond
2004
Masahiro Hashimoto
Takeyuki Yamada
Minoru Sakamoto
Mutsumi Hara
Yasushi Ohkubo
Masao Ushida
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Improvement of NLD mask dry etching system for 100nm node technology
2002
Yoshiyuki Tanaka
Nobuyuki Yoshioka
Noriyuki Harashima
Takaei Sasaki
Kiyoshi Kuwahara
Toshio Hayashi
Mutsumi Hara
Yasushi Ohkubo
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Evaluation of loading effect of NLD dry etching: II
2001
Tatsuya Fujisawa
Takayuki Iwamatsu
Koji Hiruta
Hiroaki Morimoto
Noriyuki Harashima
Takaei Sasaki
Mutsumi Hara
Kazuhide Yamashiro
Yasushi Okubo
Yoichi Takehana
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Citations (1)
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