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E. Napolitani
E. Napolitani
Ion implantation
Doping
Materials science
Silicon
Impurity
5
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2
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0
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Characterization and modeling of thermally-induced doping contaminants in high-purity Germanium.
2018
arXiv: Instrumentation and Detectors
Virginia Boldrini
G. Maggioni
S. Carturan
W. Raniero
Francesco Sgarbossa
R. Milazzo
D. R. Napoli
E. Napolitani
Davide De Salvador
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EFFECTOFHeINDUCEDNANOVOID ON BIMPLANTED INSi: THE MICROSCOPICMECHANISM
2007
International Conference on Advanced Thermal Processing of Semiconductors
E. Brunoa
S. Mirabella
Filippo Giannazzo
E. Napolitani
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Novel aspects of the atomic transport of B implanted in silicon at energies below 1 keV
2000
V. Privitera
E. Napolitani
F Priolo
S. Moffatt
E. Rimini
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The effect of the impurity content and of the surface on the electrical activation of low energy implanted boron in crystalline Si
1998
V. Privitera
F Priolo
G. Mannino
E. Napolitani
A. Carnera
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A novel method to suppress transient enhanced diffusion of low energy implanted boron based on reactive plasma etching
1998
V. Privitera
F Priolo
G. Mannino
E. Napolitani
A. Carnera
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