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J. J. Barnes
J. J. Barnes
STMicroelectronics
Diffusion barrier
Chemistry
Analytical chemistry
Silicon
Mineralogy
2
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Evaluation of titanium as a diffusion barrier between aluminum and silicon for 1.2 μm CMOS integrated circuits
1987
Journal of The Electrochemical Society
M M Farahani
T. E. Turner
J. J. Barnes
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