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A Clark
A Clark
Honeywell
Metalorganic vapour phase epitaxy
Thin film
Oxygen
Chemical vapor deposition
Impurity
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Performance of sub-atmospheric pressure hydride gas source and delivery system for MOCVD
2004
Journal of Crystal Growth
Mark W. Raynor
Virginia H. Houlding
R. Frye
S. Griffing
A Clark
B Walterson
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