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Stefan Tinck
Stefan Tinck
Silicon
Shallow trench isolation
Surface layer
Inductively coupled plasma
Monte Carlo method
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Effects of gas and surface temperatures during cryogenic etching of silicon with SF6/O2
2016
Stefan Tinck
Erik C. Neyts
Thomas Tillocher
Remi Dussart
Annemie Bogaerts
Plasmant Team
Gremi Team
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