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Peter Choi
Peter Choi
ASML Holding
Extreme ultraviolet lithography
Resist
Physics
high volume manufacturing
Optics
2
Papers
1
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0
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2024
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EUV via hole pattern fidelity enhancement through novel resist and post-litho plasma treatment
2018
Hidetami Yaegashi
Kyohei Koike
Carlos Fonseca
Fumiko Yamashita
Kumar Kaushik
Shinya Morikita
Kiyohito Ito
Shota Yoshimura
Vadim Timoshkov
Mark Maslow
Tae Kwon Jee
Liesbeth Reijnen
Peter Choi
Mu Feng
Chris Spence
Stijn Schoofs
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EUV local CDU healing performance and modeling capability towards 5nm node
2017
Tae Kwon Jee
Vadim Timoshkov
David Rio
Yu-Cheng Tsai
Peter Choi
Hidetami Yaegashi
Kyohei Koike
Carlos Fonseca
Stijn Schoofs
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