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Eugene Yu-Jin Kong

National University of Singapore

7

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Hybrid Design Using Metal–Oxide– Semiconductor Field-Effect Transistors and Negative-Capacitance Field-Effect Transistors for Analog Circuit Applications

2021 IEEE Transactions on Electron Devices
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Extraction of Polarization-Dependent Damping Constant for Dynamic Evaluation of Ferroelectric Films and Devices

2018 IEEE Electron Device Letters
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Sub-400 degrees C Si2H6 Passivation, HfO2 Gate Dielectric, and Single TaN Metal Gate: A Common Gate Stack Technology for In0.7Ga0.3As and Ge1-xSnx CMOS

2013 IEEE Transactions on Electron Devices
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Epitaxial Nickel Distanogermanide [Ni(Ge 1-x Sn x ) 2 ] Contact Formation using Pulsed Laser Annealing

2013 The Japan Society of Applied Physics
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New Tellurium implant and segregation for contact resistance reduction and single metallic silicide technology for independent contact resistance optimization in n- and p-FinFETs

2011 VLSI-TSA | International Symposium on VLSI Technology, Systems, and Applications
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