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Bas Dielissen
Bas Dielissen
Optoelectronics
Passivation
Materials science
Atomic layer deposition
Inorganic chemistry
9
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43
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Resistive Intrinsic ZnO Films Deposited by Ultrafast Spatial ALD for PV Applications
2015
IEEE Journal of Photovoltaics
Naomi Nandakumar
Bas Dielissen
Diana Garcia-Alonso
Zhe Liu
R. Görtzen
W.M.M. Kessels
Armin G. Aberle
Bram Hoex
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Citations (11)
Large-Area n-Type PERT Solar Cells Featuring Rear p + Emitter Passivated by ALD Al 2 O 3
2015
IEEE Journal of Photovoltaics
Emanuele Cornagliotti
A. Uruena
Monica Aleman
Aashish Sharma
Loic Tous
Richard Russell
Patrick Choulat
Jia Chen
Joachim John
Michael Haslinger
Filip Duerinckx
Bas Dielissen
R. Görtzen
Lachlan E. Black
Jozef Szlufcik
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Citations (12)
Large Area N-Type C-Si Solar Cells Featuring Rear Emitter and Efficiency Beyond 21%
2014
PEC | World Conference on Photovoltaic Energy Conversion
Emanuele Cornagliotti
Aashish Sharma
A. Uruena
Monica Aleman
Loic Tous
Richard Russell
Patrick Choulat
Jia Chen
Joachim John
Filip Duerinckx
Bas Dielissen
R. Görtzen
Lachlan E. Black
Jozef Szlufcik
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Citations (2)
Silicon Surface Passivation by Al2O3 Films Grown by Spatial Atomic Layer Deposition Using Low-Cost Precursors
2013
PEC | World Conference on Photovoltaic Energy Conversion
Bram Hoex
Armin G. Aberle
Shubham Duttagupta
R. Görtzen
F.M.M. Souren
Bas Dielissen
Fen Lin
Naomi Nandakumar
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Post-Deposition Thermal Treatment of Ultrafast Spatial ALD Al2O3 for the Rear Side Passivation of p-Type PERC Solar Cells
2013
PEC | World Conference on Photovoltaic Energy Conversion
R. Sastrawan
B.-U. Sander
Katrin Weise
D. Pysch
R. Görtzen
M. Bijker
Bas Dielissen
F.M.M. Souren
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Citations (5)
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