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Antoine Durandet

Australian National University

24

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511

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Luminescence from Si nanocrystals in silica deposited by helicon activated reactive evaporation

2001 Applied Physics Letters
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Effect of Pulsing the Plasma Source and the Bias Power on the Deposition of Silicon Oxide in a Helicon Assisted Reactive Evaporation System

1998
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Fabrication and characterization of a planar gradient-index, plasma-enhanced chemical vapor deposition lens.

1997 Applied Optics
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Pure silicon plasma in a helicon plasma deposition system

1997 Applied Physics Letters
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New technology for PACVD

1996 Surface & Coatings Technology
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Transport phenomenon in a Helicon Activated Reactive Evaporation system

1996
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UV-induced index change in hydrogen-free germano-silicate waveguides

1996 Electronics Letters
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Comparison between RFEA and sector analysis of plasma ion energies

1996
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EFFECT OF ION ENERGY ON THE OPTICAL AND STRUCTURAL PROPERTIES OF SIO2 GROWN BY PLASMA-ENHANCED CHEMICAL-VAPOR DEPOSITION

1996 Journal of Applied Physics
- Antoine Durandet
- David R. McKenzie
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High pressure phases produced by low energy ion implantation with reference to cubic boron nitride

1995 Nuclear Instruments & Methods in Physics Research Section B-beam Interactions With Materials and Atoms
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Citations (41)