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Nabila Baba-Ali

ASML Holding

7

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16

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Tolerance analysis of non-depolarizing double-pass polarimetry

2020 PhotoniX
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Achieving mask-based imaging with optical maskless lithography

2006
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Impression lithographique avec lumiere polarisee

2004
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Overcoming the resolution challenge using special illumination techniques to print 50/50-nm nested contact holes at 157-nm wavelength

2003
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Application of rigorous electromagnetic simulation to SLM-based maskless lithography for 65-nm node

2003
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Citations (7)