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Dae-hong Ko
Dae-hong Ko
Samsung
Chemical vapor deposition
Chemistry
Analytical chemistry
Thin film
Silicon nitride
2
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18
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Characteristics of PECVD grown tungsten nitride films as diffusion barrier layers for ULSI DRAM applications
1997
Journal of Electronic Materials
Byung-lyul Park
Dae-hong Ko
Young-sun Kim
Jung Min Ha
Young Wook Park
Sang In Lee
Hyeon-deok Lee
Myoung-Bum Lee
U In Chung
Young-Bum Koh
Moon Yong Lee
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Citations (17)
Characteristics of the NO dielectric film with low pressure chemical vapor deposition in-situ nitridation
1994
Journal of Electronic Materials
Kyung Ah Kim
Dae-hong Ko
Suk Hoon Kang
Sang-Gab Kim
S. J. Shim
E. S. Kim
SungTae Ahn
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Citations (1)
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