author-photo

Hiroshi Ohtsuka

Oki Electric Industry

22

Papers

30

Citations

Citation Trend

Filter By

Papers (15) Sort By

Journal Conference Others

Conjugate twin-shifter for the new phase shift method to high resolution lithography

2004 SPIE milestone series
Show All
- Source
- Cite
- Save
Citations (0)
ArF excimer laser lithography with bottom antireflective coating

1998
Show All
- Source
- Cite
- Save
Citations (1)
Fabrication of 0.13-μm device patterns by argon fluoride excimer laser lithography with practical resolution enhancement techniques

1997 MNC | International Microprocesses and Nanotechnology Conference
Show All
- Source
- Cite
- Save
Citations (6)
Multi-generation device fabrication by ArF lithography

1997 IEDM | International Electron Devices Meeting
Show All
- Source
- Cite
- Save
Citations (2)
Acid amplification of chemically amplified resists for 193-nm lithography

1997
Show All
- Source
- Cite
- Save
Citations (3)
Fabrication of 0.1 µm Patterns Using an Alternating Phase Shift Mask in ArF Excimer Laser Lithography

1997 MNC | International Microprocesses and Nanotechnology Conference
Show All
- Source
- Cite
- Save
Citations (1)
Enhancement of Defocus Characteristics with Intermediate Phase Interference in Phase Shift Method (Special Issue on Quarter Micron Si Device and Process Technologies)

1994 IEICE Transactions on Electronics
Show All
- Source
- Cite
- Save
Citations (0)
New method for etching rate and resist profile control in O2RIE

1993
Show All
- Source
- Cite
- Save
Citations (2)
Diagonal Phase Errors Affecting Optical Intensity in Phase Defect Repair Elements

1993 Japanese Journal of Applied Physics
Show All
- Source
- Cite
- Save
Citations (0)
Evaluation of repair phase and size tolerance for a phase‐shift mask

1993 Journal of Vacuum Science & Technology B
Show All
- Source
- Cite
- Save
Citations (0)