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Thomas Steinhaeusler
Thomas Steinhaeusler
Bilayer
Resist
Silicon
Copolymer
Materials science
3
Papers
5
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Second-generation 193-nm bilayer resist
1999
Patrick Foster
Thomas Steinhaeusler
John J. Biafore
Gregory Spaziano
Sydney G. Slater
Andrew J. Blakeney
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Citations (1)
Optimization of etch conditions for a silicon-containing methacrylate-based bilayer resist for 193-nm lithography
1998
Thomas Steinhaeusler
Allen H. Gabor
Daniela White
Andrew J. Blakeney
David R. Stark
Daniel Miller
Georgia K. Rich
Victoria L. Graffenberg
Kim Dean
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Citations (4)
Thermal stability of silicon-containing methacrylate-based bilayer resist for 193-nm lithography
1998
Daniela White
Bernard T. Beauchemin
Andrew J. Blakeney
Thomas Steinhaeusler
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