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H. Shin

University of Illinois at Urbana–Champaign

21

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182

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Control of electron energy distributions in inductively coupled plasmas using tandem sources

2013 ICOPS | International Conference on Plasma Science
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Ion energy distributions, electron temperatures, and electron densities in Ar, Kr, and Xe pulsed discharges

2012 Journal of Vacuum Science and Technology
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Ion energy distributions in inductively coupled plasmas having a biased boundary electrode

2012 Plasma Sources Science and Technology
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Surprising importance of photo-assisted etching of silicon in chlorine-containing plasmas

2012 Journal of Vacuum Science and Technology
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Ion Energy Distributions in Pulsed Inductively-Coupled Plasmas Having a Pulsed Boundary Electrode

2011 Bulletin of the American Physical Society
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In situ plasma diagnostics study of a commercial high-power hollow cathode magnetron deposition tool

2010 Journal of Vacuum Science and Technology
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Sn debris cleaning by plasma in DPP EUV source systems for HVM

2010 Proceedings of SPIE
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Development and characterization of a secondary RF plasma-assisted closed-field dual magnetron sputtering system for optical coatings on large-area substrates

2010 Plasma Sources Science and Technology
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Remote plasma cleaning of Sn from an EUV collector mirror

2009 Proceedings of SPIE
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Tin removal from extreme ultraviolet collector optics by inductively coupled plasma reactive ion etching

2008 Journal of Vacuum Science and Technology
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