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Timothy A. Brunner
Timothy A. Brunner
ASML Holding
Resist
Lithography
Extreme ultraviolet lithography
Topology
Computer science
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2
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EUV dark field lithography: extreme resolution by blocking 0th order
2021
Timothy A. Brunner
Jara Garcia Santaclara
Gerardo Bottiglieri
Christopher N. Anderson
Patrick P. Naulleau
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One metric to rule them all: new k4 definition for photoresist characterization
2020
Jara Garcia Santaclara
Bernd Geh
Anthony Yen
Timothy A. Brunner
Danilo De Simone
Joren Severi
Gijsbert Rispens
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