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O. Sublemontier
O. Sublemontier
Commissariat à l'énergie atomique et aux énergies alternatives
Plasma
Optics
Laser
Extreme ultraviolet
Energy conversion efficiency
2
Papers
1
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0
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Modular EUV Source for the Next Generation Lithography
2011
Journal of Laser Micro Nanoengineering
O. Sublemontier
M. Rosset-Kos
T. Ceccotti
Jean-François Hergott
Thierry Auguste
D. Normand
M. Schmidt
F Beaumont
D. Farcage
Guy Cheymol
J.-M. Le Caro
Philippe Cormont
P. Mauchien
Pierre-Yves Thro
J. Skrzypczak
S Muller
E. Marquis
Benoit Barthod
I. Gaurand
M. Davenet
R. Bernard
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Citations (1)
Laser and optical developments of a modular laser-plasma source for EUV lithography
2005
Guy Cheymol
Ph. Cormont
D. Farcage
A. Montmerle Bonnefois
Pierre-Yves Thro
Jean-Marc Weulersse
M. Schmidt
O. Sublemontier
Benoit Barthod
I. Gaurand
J. Skrzypczak
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