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Christof G. Krautschik

Intel

6

Papers

73

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Comparison of techniques to measure the point spread function due to scatter and flare in EUV lithography systems

2004
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Anisotropic EUV flare measured in the engineering test stand (ETS)

2004
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Determination of the flare specification and methods to meet the CD control requirements for the 32-nm node using EUVL

2004
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Implementing flare compensation for EUV masks through localized mask CD resizing

2003
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