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K. Choi

SEMATECH

4

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157

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Dipole model explaining high-k/metal gate field effect transistor threshold voltage tuning

2008 Applied Physics Letters
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Effects of TiN overlay on ALD TaCN metal gate/high-k MOSFET characteristics

2005 DRC | Device Research Conference
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Impact of Metal Gate Deposition Method on Characteristics of Gate-First MOSFET with Hf-Silicate

2005 Electrochemical and Solid State Letters
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An integratable dual metal gate/high-k CMOS solution for FD-SOI and MuGFET technologies

2005 SOI | International SOI Conference
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