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Takayuki Ito
Takayuki Ito
Toshiba
Materials science
Annealing (metallurgy)
Ion implantation
MOSFET
Doping
5
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46
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Issues and Optimization of Millisecond Anneal Process for 45 nm node and beyond
2006
MRS Proceedings
K. Adachi
K. Ohuchi
Nobutoshi Aoki
Hideji Tsujii
Takayuki Ito
Hiroshi Itokawa
Koji Matsuo
Honguh Yoshinori
Naoki Tamaoki
K. Ishimaru
H. Ishiuchi
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Improvement of performance deviation and productivity of MOSFETs with gate length below 30 nm by flash lamp annealing
2004
ISSM | International Symposium on Semiconductor Manufacturing
Kazumi Nishinohara
Takayuki Ito
Kyoichi Suguro
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Ultra-shallow junction formation by low energy ion implantation and flash lamp annealing
2003
Kyoichi Suguro
Takayuki Ito
Takaharu Itani
Toshihiko Iinuma
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Low-resistance ultrashallow extension formed by optimized flash lamp annealing
2003
ISSM | International Symposium on Semiconductor Manufacturing
Takayuki Ito
Kyoichi Suguro
Mizuki Tamura
Toshiyuki Taniguchi
Yukihiro Ushiku
Toshihiko Iinuma
Takaharu Itani
Masaki Yoshioka
Tatsushu Owada
Yasuhiro Imaoka
Hiromi Murayama
Tatasufumi Kusuda
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Citations (18)
Casting method and device with a resin core
1996
Masamichi Okada
Tatsuhiko Sawamura
Norio Hayashi
Takayuki Ito
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