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Liping Fang

China Academy of Engineering Physics

5

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Target Voltage Hysteresis Behavior and Control Point in the Preparation of Aluminum Oxide Thin Films by Medium Frequency Reactive Magnetron Sputtering

2018 THE Coatings
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Substrate Temperature Dependent Properties of Sputtered AlN:Er Thin Film for In-Situ Luminescence Sensing of Al/AlN Multilayer Coating Health

2018 Materials
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TiN Films Deposited on Uranium by High Power Pulsed Magnetron Sputtering under Low Temperature

2018 Materials
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Fretting Wear Behavior and Photoelectron Spectroscopy (XPS) Analysis of a Ti/TiN Multilayer Film Deposited on Depleted Uranium

2018 Materials
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Citations (2)