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van der K Tak
van der K Tak
Philips
Analytical chemistry
Ion implantation
Silicon
Radiochemistry
Doping
3
Papers
43
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Doping fin field-effect transistor sidewalls: Impurity dose retention in silicon due to high angle incident ion implants and the impact on device performance
2008
Journal of Vacuum Science & Technology B
Ray Duffy
G. Curatola
Bartlomiej Jan Pawlak
G. Doornbos
van der K Tak
P Breimer
van Jgm Berkum
F. Roozeboom
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Citations (38)
Evolution of fluorine and boron profiles during annealing in crystalline Si
2008
Journal of Vacuum Science & Technology B
Pedro López
Lourdes Pelaz
Ray Duffy
Philippe Meunier-Beillard
F. Roozeboom
van der K Tak
P Breimer
van Jgm Berkum
Marcel A. Verheijen
M. Kaiser
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Citations (3)
Si interstitial contribution of F+ implants in crystalline Si
2008
Journal of Applied Physics
Pedro López
Lourdes Pelaz
Ray Duffy
P. Meunier-Beillard
F. Roozeboom
van der K Tak
P Breimer
van Jgm Berkum
Marcel A. Verheijen
M. Kaiser
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Citations (2)
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