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J.H. Park
J.H. Park
University of Illinois at Chicago
Analytical chemistry
Chemistry
Doping
Annealing (metallurgy)
Molecular beam epitaxy
5
Papers
61
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In Situ Arsenic Doping of CdTe/Si by Molecular Beam Epitaxy
2015
Journal of Electronic Materials
Stuart Farrell
Teresa M. Barnes
Wyatt K. Metzger
J.H. Park
R. Kodama
S. Sivananthan
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Citations (13)
The effect of post-annealing on Indium Tin Oxide thin films by magnetron sputtering method
2014
Applied Surface Science
J.H. Park
Christopher Buurma
S. Sivananthan
R. Kodama
Wei Gao
T. A. Gessert
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Citations (27)
Incorporation and Activation of Arsenic Dopant in Single-Crystal CdTe Grown on Si by Molecular Beam Epitaxy
2014
Journal of Electronic Materials
J.H. Park
Stuart Farrell
R. Kodama
C. Blissett
X. Wang
Eric Colegrove
Wyatt K. Metzger
T. A. Gessert
S. Sivananthan
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Citations (15)
Nitrogen Plasma Doping of Single-Crystal ZnTe and CdZnTe on Si by MBE
2013
Journal of Electronic Materials
Richard Kodama
Thomas Seldrum
Xiaojin Wang
J.H. Park
Eric Colegrove
Xin Zheng
Ramesh Dhere
S. Sivananthan
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Citations (1)
Hardness and microstructure of internally oxidized silver alloys
2000
IEEE Transactions on Applied Superconductivity
B. C. Prorok
J.H. Park
K. C. Goretta
U. Balachandran
Michael J. McNallan
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Citations (5)
1