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Hiroyuki Onoda
Hiroyuki Onoda
Toshiba
Analytical chemistry
Electronic engineering
Ion implantation
Materials science
Boron
2
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1
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Leakage issues in failure analysis of p+ SiGe active area short monitor
2011
IPFA | International Symposium on the Physical and Failure Analysis of Integrated Circuits
Ankur Arya
Greg M. Johnson
P. Ronsheim
Jochonia Nxumalo
C. Molella
R. Murphy
Seung-Chul Lee
Chris Daleo
Bum Ki Moon
Hiroyuki Onoda
Chung Woh Lai
Shenzhi Yang
Yew Tuck
Clament Chow
James Lee
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Carbon incorporation into substitutional silicon site by carbon cryo ion implantation and metastable recrystallization annealing as stress technique in n-metal-oxide-semiconductor field-effect transistor
2010
IWJT | International Workshop on Junction Technology
Hiroshi Itokawa
Kiyotaka Miyano
Yusuke Oshiki
Hiroyuki Onoda
Masahito Nishigoori
Ichiro Mizushima
Kyoichi Suguro
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