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W. Dobbelaere
W. Dobbelaere
Materials science
Analytical chemistry
Oxygen
Nucleation
Precipitation
2
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1
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Plasma process-induced charging during PECVD overlay nitride deposition
1998
PPID | International Symposium on Plasma Process-Induced Damage
P. Moens
J. Viaene
W. Dobbelaere
L. Jastrzebski
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