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Annalisa Pepe
Annalisa Pepe
STMicroelectronics
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Optics
Semiconductor device fabrication
Lithography
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3
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4
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Customized illumination schemes for critical layers of 90-nm node dense memory devices in ArF lithography: comparison between simulation and experimental results
2004
Gianfranco Capetti
Maddalena Bollin
Annalisa Pepe
Gina Cotti
Sara Loi
Umberto Iessi
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Full-chip implementation of IDEALsmile on 90nm node devices with ArF lithography
2004
MNC | International Microprocesses and Nanotechnology Conference
Kenji Yamazoe
Pietro Cantu
Gianfranco Capetti
Elena Evangelista
Yasuo Hasegawa
Junji Iwasa
Olivier Toublan
Sara Loi
Marco Lupo
Annalisa Pepe
Toshihisa Kuno
Akiyoshi Suzuki
Kenji Saitoh
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Citations (3)
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