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A. Brouillard
A. Brouillard
IBM
Thin film
Electromigration
Microstructure
Log-normal distribution
Engineering
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Width Dependence of Electromigration Life in Al-Cu Al-Cu-Si, and Ag Conductors
1975
IRPS | International Reliability Physics Symposium
G. A. Scoggan
Birendra N. Agarwala
P.P. Peressini
A. Brouillard
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Citations (7)
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