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Moon-Gyu Sung
Moon-Gyu Sung
Hanyang University
Resist
Materials science
Optoelectronics
post exposure
Optics
4
Papers
17
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Temperature rising effect of 193-nm chemically amplified resist during postexposure bake
2000
Young-Mi Lee
Moon-Gyu Sung
Eun-Mi Lee
Young-Soo Sohn
Heungjin Bak
Hye-Keun Oh
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Citations (9)
Soft bake effect in 193-nm chemically amplified resist
2000
Moon-Gyu Sung
Young-Mi Lee
Eun-Mi Lee
Young-Soo Sohn
Ilsin An
Hye-Keun Oh
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Citations (3)
Refractive index change during exposure for 193-nm chemically amplified resists
1999
Hye-Keun Oh
Young-Soo Sohn
Moon-Gyu Sung
Young-Mi Lee
Eun-Mi Lee
Sung Hwan Byun
Ilsin An
Kun Sang Lee
In-Ho Park
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Citations (1)
Characteristics of 193 nm chemically amplified resist during post exposure bake and post exposure delay
1999
MNC | International Microprocesses and Nanotechnology Conference
Eun-Mi Lee
Moon-Gyu Sung
Young-Mi Lee
Young-Soo Sohn
Hye-Keun Oh
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Citations (4)
1