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Syuichi Tamamushi
Syuichi Tamamushi
Pattern formation
Optics
Beam diameter
Laser beam quality
Beam (structure)
4
Papers
14
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Triangular Shaped Beam Technique in EB Exposure System EX-7 for ULSI Pattern Formation : Lithography Technology
1989
Kiyoshi Hattori
Osamu Ikenaga
Hitotsugu Wada
Syuichi Tamamushi
Eiji Nishimura
Naotaka Ikeda
Yoshihide Katoh
Hideo Kusakabe
Ryoichi Yoshikawa
Tadahiro Takigawa
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0.25μm Pattern Formation by Variably Shaped EB Exposure System EX-7
1987
The Japan Society of Applied Physics
Kiyoshi Hattori
Syuichi Tamamushi
Hirotsugu Wada
Hideo Kusakabe
Iwao Sasaki
Takayuki Abe
Kiyomi Koyama
Osamu Ikenaga
K. Ohta
Ryoichi Yoshikawa
Tadahiro Takigawa
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Proximity Effect Correction for 1/4 μm Pattern Formation in Electron Beam Lithography
1985
The Japan Society of Applied Physics
Tadahiro Takigawa
Eiji Nishimura
Syuichi Tamamushi
Yoshihide Katoh
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