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Jin Li

AZ Electronic Materials

5

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4

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A chemical underlayer approach to mitigate shot noise in EUV contact hole patterning

2014 Proceedings of SPIE
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Underlayer and rinse materials for improving EUV resist performance

2013 Proceedings of SPIE
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A phase segregating polymer blend for 2xnm feature applications

2012 Proceedings of SPIE
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Masque à motif fin, son procédé de fabrication et procédé de formation d'un motif fin à l'aide du masque

2009
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Image reversal trilayer process using standard positive photoresist

2009 Proceedings of SPIE
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