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Hyo-Joong Kim
Hyo-Joong Kim
Sungkyunkwan University
Oxide
Gate dielectric
Gate oxide
Leakage (electronics)
Time-dependent gate oxide breakdown
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Gate leakage properties on n-MOSFET with plasma oxidized and nitrided
2009
ISDRS | International Semiconductor Device Research Symposium
Hyo-Joong Kim
Dong-Hwan Kim
Woong Lee
Yong Han Roh
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