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Masashi Yamashita

Nagoya Institute of Technology

5

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17

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Boron addition effects on aluminum nitride fabricated by radio-frequency plasma-assisted molecular beam epitaxy

2007 Physica Status Solidi (c)
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Growth and Characterization of AlBN Polycrystalline Thin Film by Radio-Frequency Plasma-Assisted Molecular Beam Epitaxy

2006 Key Engineering Materials
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Luminescent Characteristics of Undoped and Er-Doped ZnO Thin Films

2006 Key Engineering Materials
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Fabrication of Aluminum Nitride Thin Film and Its Oxidation Behavior

2006 Journal of The Society of Materials Science, Japan
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Oxidation Behavior of Aluminum Nitride Thin Films on Superalloy Substrates

2004 Journal of the Ceramic Society of Japan
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