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D. Lewke
D. Lewke
Semiconductor device fabrication
Raman spectroscopy
Analytical chemistry
Wafer dicing
Engineering
4
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1
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Raman micro-spectroscopy as a non-destructive key analysis tool in current power semiconductor manufacturing
2017
M. De Biasio
M. Kraft
E. Geier
B. Goller
Ch. Bergmann
Romain Esteve
M. Cerezuela-Barreto
D. Lewke
M Schellenberger
M. Roesner
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Direct optical stress sensing in semiconductor manufacturing using Raman micro-spectrometry
2016
SENSORS | IEEE Sensors
M. De Biasio
M. Kraft
M. Roesner
C Bergmann
M. Cerezuela-Barreto
D. Lewke
M Schellenberger
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Raman顕微分光法を用いた半導体製造における直接光学応力センシング【Powered by NICT】
2016
M. De Biasio
M. Kraft
M. Roesner
C Bergmann
M. Cerezuela-Barreto
D. Lewke
M Schellenberger
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