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Gosuke Shiraishi

12

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42

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EUV resist chemical gradient enhancement by UV flood exposure for improvement in EUV resist resolution, process control, roughness, sensitivity and stochastic defectivity

2020
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Simulation and experimentation of PSCAR chemistry for complex structures

2017 Proceedings of SPIE
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Sensitivity enhancement of chemically amplified resists and performance study using extreme ultraviolet interference lithography

2016 Journal of Micro-nanolithography Mems and Moems
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Novel High Sensitivity EUV Photoresist for Sub-7 nm Node

2016 Journal of Photopolymer Science and Technology
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Challenge toward breakage of RLS trade-off for EUV lithography by Photosensitized Chemically Amplified Resist (PSCAR) with flood exposure

2016 Proceedings of SPIE
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Sensitivity enhancement of chemically amplified resists and performance study using EUV interference lithography

2016 Proceedings of SPIE
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Fabrication of Porous Smectite/SiO2 Composites

2001 Key Engineering Materials
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Citations (1)