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S. Pauliac
S. Pauliac
Analytical chemistry
Optics
Resist
Electron-beam lithography
Lithography
6
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62
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Improvement of HfO 2 based RRAM array performances by local Si implantation
2017
IEDM | International Electron Devices Meeting
Marios Barlas
Alessandro Grossi
Laurent Grenouillet
Elisa Vianello
Emmanuel Nolot
N. Vaxelaire
P. Blaise
B. Traore
Jean Coignus
F. Perrin
R. Crochemore
F. Mazen
Laurent Lachal
S. Pauliac
C. Pellissier
S. Bernasconi
Sophie Chevalliez
J.-F. Nodin
L. Perniola
Etienne Nowak
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Citations (5)
Hybrid lithography process for nano-scale devices
2006
Microelectronic Engineering
S. Pauliac
S. Landis
J. Foucher
J. Thiault
O. Faynot
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Citations (10)
Line edge roughness characterization with a three-dimensional atomic force microscope: Transfer during gate patterning processes
2005
Journal of Vacuum Science & Technology B
J. Thiault
J. Foucher
J.H. Tortai
O. Joubert
S. Landis
S. Pauliac
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Citations (30)
Full three-dimensional characterization of 25nm lines for chemically amplified resist simulation
2005
Journal of Vacuum Science & Technology B
S. Landis
S. Pauliac
J. Foucher
J. Thiault
F. De Crecy
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Citations (3)
Negative-tone chemically-amplified resist development for high resolution hybrid lithography
2004
Microelectronic Engineering
S. Landis
S. Pauliac
Ryotaro Hanawa
Masumi Suetsugu
M. Akita
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Citations (2)
Ultra high resolution hybrid lithography with negative tone chemically amplified resists
2003
MNC | International Microprocesses and Nanotechnology Conference
S. Landis
S. Pauliac
Ryotaro Hanawa
M. Suestsugu
M. Akita
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Citations (12)
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