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Victor Pham
Victor Pham
IBM
Reactive-ion etching
Nanotechnology
Photolithography
Photoresist
Resist
2
Papers
25
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Reactive ion etching of fluorine containing photoresist
2006
Kaushal S. Patel
Victor Pham
Wenjie Li
Mahmoud Khojasteh
Pushkara Rao Varanasi
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Citations (16)
Silicon containing polymer in applications for 193 nm high NA lithography processes
2006
Sean D. Burns
Dirk Pfeiffer
Arpan P. Mahorowala
Karen Petrillo
Alexandera Clancy
Katherina Babich
David R. Medeiros
Scott D. Allen
Steven J. Holmes
Michael Crouse
Colin J. Brodsky
Victor Pham
Yi-Hsiung Lin
Kaushal S. Patel
Naftali E. Lustig
Allen H. Gabor
Christopher D. Sheraw
Phillip J. Brock
Carl E. Larson
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Citations (9)
1