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Takahiro Teshima
Takahiro Teshima
Clariant
Calixarene
Resist
Silicon
Electron-beam lithography
Photoresist
3
Papers
54
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High-resolution, High-purity Calix[n]arene Electron Beam Resist
2000
Journal of Photopolymer Science and Technology
Yukinori Ochiai
Shoko Manako
Hiromasa Yamamoto
Takahiro Teshima
Jun-ichi Fujita
Eiichi Nomura
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Citations (22)
High-purity, ultrahigh-resolution calixarene electron-beam negative resist
2000
Journal of Vacuum Science & Technology B
Shoko Manako
Yukinori Ochiai
Hiromasa Yamamoto
Takahiro Teshima
Jun-ichi Fujita
Eiichi Nomura
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Citations (13)
Nanometer-scale resolution of a chloromethylated calixarene negative resist in electron-beam lithography: Dependence on the number of phenolic residues
2000
Applied Physics Letters
Toshitsugu Sakamoto
Shoko Manako
Jun-ichi Fujita
Yukinori Ochiai
Toshio Baba
Hiromasa Yamamoto
Takahiro Teshima
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Citations (19)
1